Specialized meeting on atomic-scale thin film growth and etching with strong industry engagement, tutorials and a tradeshow. Format: In person; one day of tutorials and perspectives followed by three ...

Atomic layer deposition (ALD) originated from atomic layer epitaxy, which was introduced in 1970 and initially used in electroluminescent displays. It rapidly revolutionized semiconducting ...

Atomic layer deposition (ALD) used to be considered too slow to be of practical use in semiconductor manufacturing, but it has emerged as a critical tool for both transistor and interconnect ...

(Nanowerk News) A research team, led by Professor Joonki Suh in the Department of Materials Science and Engineering and the Graduate School of Semiconductor Materials and Devices Engineering at UNIST, ...

Kalpana Systems, a Dutch equipment manufacturer, is launching spatial atomic layer deposition (sALD) tools to be used in roll-to-roll manufacturing processes in the solar PV, organic light emitting ...